Handbook of Advanced Plasma Processing Techniques

By: R. J. Shul, S. J. Pearton (Editor)

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Hardcover | 28 August 2000

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672 Pages

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23.39 x 15.6 x 3.66

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

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Some Fundamental Aspects of Plasma-Assisted Etching	p. 1
Plasma Fundamentals for Materials Processing	p. 33
Plasma Modeling	p. 69
Plasma Reactor Modeling	p. 123
Overview of Plasma Diagnostic Techniques	p. 145
Mass Spectrometric Characterization of Plasma Etching Processes	p. 205
Fundamentals of Plasma Process-Induced Charging and Damage	p. 257
Surface Damage Induced by Dry Etching	p. 309
Photomask Etching	p. 361
Bulk Si Micromachining for Integrated Microsystems and MEMS Processing	p. 419
Plasma Processing of III-V Materials	p. 459
Ion Beam Etching of Compound Semiconductors	p. 507
Dry Etching of InP Vias	p. 549
Device Damage During Low Temperature High-Density Plasma Chemical Vapor Deposition	p. 575
Dry Etching of Magnetic Materials	p. 607
Subject Index	p. 649
Table of Contents provided by Blackwell. All Rights Reserved.

Handbook of Advanced Plasma Processing Techniques

At a Glance

Hardcover

Shipping

How to return your order

Defective items

You Can Find This Book In

Other Editions and Formats

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