Introduction | p. 1 |
Major Applications and Requirements | p. 1 |
Performances and Research Subjects | p. 1 |
Historical Development | p. 8 |
Gas Discharge Fundamentals | p. 11 |
Thermionic Emission | p. 11 |
Secondary Electron Emission | p. 12 |
Surface Ionization | p. 13 |
Elastic and Inelastic Collisions | p. 16 |
Collision and Probability of Collision | p. 16 |
Elastic Collision and Its Cross Section | p. 18 |
Inelastic Collision | p. 20 |
Ionization Cross Section | p. 21 |
Recombination of Charged Particles | p. 22 |
Mobility | p. 23 |
Diffusion Coefficient | p. 25 |
Particle Distribution in a Retardation Region | p. 26 |
Ambipolar Diffusion | p. 26 |
Magnetic Field Influence on Particle Motion | p. 28 |
Fundamentals of a Hot-Cathode Arc Source | p. 29 |
Stable Theory of the Cathode Double Sheath | p. 29 |
Bipolar Flow | p. 30 |
CathodeDoubleSheath | p. 31 |
Cathode Double Sheath Oscillations and Noise | p. 34 |
Scattering of Primary Electrons | p. 35 |
Beam-Plasma Interaction | p. 36 |
Positive Column Plasma | p. 38 |
Anode Region | p. 44 |
Minimum Pressure | p. 45 |
References | p. 46 |
Extraction Systems for Ion Sources | p. 47 |
Extraction Systems Requirements | p. 47 |
Extraction System with a Solid Emitter | p. 48 |
Space-Charge-Limited Flow for an Ideal Diode | p. 48 |
Plane Diode | p. 48 |
Cylindrical Diode | p. 51 |
Spherical Diode | p. 51 |
Some Universal Relationships | p. 52 |
Space-Charge-Limited Flow with Multiple Ion Species | p. 54 |
Pierce-Shape Extraction System | p. 56 |
High-Perveance Electron Gun | p. 57 |
Emittance and Brightness | p. 58 |
Emittance | p. 58 |
Brightness | p. 60 |
Relation Between Brightness and Emittance | p. 61 |
Effective Emittance | p. 62 |
Emittance and Brightness of an Ion Source | p. 63 |
Ion Extraction from a Plasma | p. 65 |
Plasma-Sheath Equation and the Emitting Current from a Plasma | p. 65 |
The "Extractable Flow" from an Extraction System | p. 70 |
Adjustment of Ion Emissive Surface | p. 71 |
Comparison between a Plasma Ion Source and an Electron Gun Extraction System | p. 72 |
Geometry of Extraction Systems | p. 73 |
Typical Types and Geometries | p. 73 |
Probe Extraction Systems for Low Plasma Density | p. 76 |
Principle and Analytical Model | p. 76 |
Experimental Results | p. 79 |
Aperture Extraction Systems for Medium Plasma Density | p. 79 |
Analytical Model for a Two-Electrode System | p. 80 |
Circular Three Electrode Extraction System | p. 83 |
Slit Extraction System | p. 86 |
Four Electrode Extraction System | p. 89 |
Expansion Cup Extraction System for High Plasma Density | p. 90 |
Some Properties of a Diffusing Plasma | p. 90 |
Extraction System of a Duoplasmatron Source | p. 92 |
Large-Area Multi-Aperture Extraction Systems | p. 95 |
Multi-aperture Beam Focusing by Aperture Displacement | p. 96 |
Power Loading of the Electrodes | p. 100 |
Grid-controlled Extraction System | p. 101 |
Research Methods of Extraction Systems | p. 103 |
Experimental Research | p. 103 |
Analytical Approaches to Beam Optics | p. 103 |
Numerical Simulations | p. 104 |
Physical Models | p. 104 |
Physical Equations | p. 106 |
Some Results | p. 108 |
Some Other Problems | p. 110 |
Transverse Magnetic Field Effects on Ion Extraction | p. 110 |
Technological Problems of Extraction Systems | p. 111 |
Suppression of Breakdown in the Lateral Extraction Ion Source | p. 111 |
Some Technological Problems | p. 112 |
References | p. 113 |
Positive Ion Sources | p. 116 |
Classification of Ion Sources | p. 116 |
Hot Cathodes | p. 118 |
Requirements and Types of Hot Cathodes | p. 118 |
Cathode Material and Lifetime | p. 119 |
Effects of Discharge Current | p. 122 |
Magnetic Field Effects of the Filament Current | p. 122 |
Plasma Cathodes | p. 123 |
Arc Source in a Uniform Magnetic Field | p. 125 |
Hot-Cathode Penning Source | p. 131 |
Simple Principle | p. 131 |
Typical Structures | p. 134 |
Duoplasmatron Ion Source | p. 135 |
General Principle | p. 135 |
Formation of the Constriction Double Sheath | p. 137 |
Primary Parameters | p. 138 |
Heavy Ion Duoplasmatron Source | p. 141 |
Hot-Cathode "Freeman" Source | p. 142 |
Broad Beam Ion Sources | p. 144 |
Cold-Cathode PIG Source | p. 148 |
Principles of a Cold-Cathode Penning Discharge | p. 148 |
Cold-Cathode PIG Sources | p. 149 |
Radio-Frequency Ion Source | p. 153 |
Principle of an RF Discharge | p. 153 |
Magnetic Field Effects and Structures | p. 157 |
Heavy Ion RF Sources | p. 159 |
Metallic Ion RF Sources | p. 159 |
RF Ion Source for Ion Thrusters | p. 161 |
RF Tritium Ion Source | p. 162 |
Beam Current Modulation from RF Sources | p. 162 |
Technology of Heavy Ion Sources | p. 163 |
Special Requirements for Heavy Ion Sources | p. 163 |
Types of Heavy Ion Sources | p. 164 |
Surface Ionization and Thermionic Emission Source | p. 165 |
High Field Ion Source | p. 168 |
Gas Field Ionization Source | p. 169 |
Liquid Metal Ion Source | p. 170 |
Feed Material | p. 174 |
Methods of Vapor Transport | p. 176 |
Design and Operation of Heavy Ion Sources | p. 179 |
References | p. 182 |
Giant Ion Sources | p. 187 |
DuoPIGatron Ion Source | p. 188 |
Essential Principle | p. 188 |
Improvement of the Plasma Uniformity | p. 190 |
Typical Results | p. 193 |
Periplasmatron Ion Source | p. 196 |
Multifilament Ion Source | p. 197 |
Essential Principle | p. 197 |
Multifilaments and Multislot Extraction Electrode | p. 199 |
Ionization Efficiency | p. 200 |
Typical Results | p. 201 |
Magnetic Multipole Ion Source | p. 203 |
General Description | p. 203 |
Magnetic Multipole (Multicusp) Field | p. 204 |
Confinement Principle of a Cusped Field | p. 204 |
Magnetic Field Configuration | p. 206 |
Influence of Other Parameters | p. 209 |
Typical Results and Applications | p. 212 |
Hall Accelerator | p. 213 |
Cluster Ion Source | p. 216 |
Intense Pulsed Ion Source | p. 218 |
Reflex Triode | p. 219 |
Magnetically Insulated Ion Diode | p. 220 |
Anode Plasma and Structure | p. 222 |
References | p. 225 |
Multiply Charged Ion Sources | p. 229 |
Introduction | p. 229 |
Formation of Multiply Charged Ions | p. 231 |
Physical Definitions for Multiple Ionization | p. 231 |
Ionization Potential | p. 231 |
Total and Partial Ionization Cross Section | p. 232 |
Distribution of Charge States and Average Charge State | p. 233 |
Formation of Multiply Charged Ions | p. 233 |
Multiple Ionization by Single Collisions | p. 233 |
Stepwise Single Ionization of Ions | p. 235 |
Stepwise Multiple Ionization of Ions | p. 238 |
Ionization of Metastable Atoms or Ions | p. 238 |
Loss Processes of Multiply Charged Ions | p. 239 |
Loss by Charge Transfer | p. 239 |
Loss by Recombination | p. 240 |
Loss by Diffusion | p. 241 |
Balance Equations for Ion Charge States | p. 243 |
Multiply Charged Ion Generation by Stripping of Fast Ions | p. 246 |
Major Research of MCIS | p. 246 |
Multiply Charged Electron Beam Ion Source | p. 249 |
Electron Beam Ion Source | p. 249 |
Typical Structure | p. 249 |
Essential Principle and Results | p. 251 |
Electron Beam Ion Trap | p. 255 |
Time-of-Flight EBIS (TOFEBIS) | p. 256 |
Conventional Multiply Charged Ion Sources | p. 256 |
Penning Multicharged Ion Source | p. 256 |
Introduction, Types, and Typical Structures | p. 256 |
The Essential Principle of Generating Multiply Charged Ions in a PIG Source | p. 257 |
Experimental Results | p. 258 |
Duoplasmatron MCIS | p. 261 |
Other Plasma Discharge MCIS | p. 263 |
Radio-Frequency Ion Source | p. 263 |
Electrostatic Oscillating Electron Ion Source | p. 263 |
Trapped Ion Source | p. 264 |
Microwave Ion Sources | p. 264 |
Electron Cyclotron Resonance Multiply Charged Ion Source | p. 264 |
Development and Typical Structure | p. 264 |
Essential Principles and Results | p. 268 |
High Intensity Microwave Ion Source | p. 277 |
Cavity Type Microwave Ion Source | p. 277 |
Antenna Type Microwave Ion Source | p. 281 |
High-intensity Microwave Proton Source | p. 282 |
Hot Electron Layer Ion Source (HELIOS) | p. 284 |
Beam-Plasma Ion Source | p. 285 |
High Density Plasma Sources | p. 286 |
Laser Multiply Charged Ion Source | p. 286 |
Metal Vapor Vacuum Arc Ion Sources | p. 292 |
Vacuum Spark Ion Source | p. 297 |
References | p. 297 |
Mass and Energy Spectra of Ion Sources | p. 304 |
Mass Spectra of a Hydrogen Ion Source | p. 304 |
Physical Processes Effecting the Mass Spectra | p. 305 |
Particle Balance Equations for Determining the Mass Spectra | p. 310 |
Proton Content of an RF Ion Source | p. 313 |
Mass Spectra of a Magnetic Multipole Ion Source | p. 314 |
Mass Spectra of a Duoplasmatron Ion Source | p. 315 |
Mass Spectra of a Hot-Cathode PIG Ion Source | p. 316 |
Mass Spectra of a Cold-Cathode PIG Ion Source | p. 317 |
Energy Spectra of Ion Sources | p. 318 |
Physical Cause of the Energy Spread | p. 318 |
Energy Spectra of an RF Ion Source | p. 319 |
Energy Spectra of Other Ion Sources | p. 322 |
References | p. 323 |
Negative Ion Sources | p. 325 |
Introduction | p. 325 |
Electron Affinity | p. 325 |
Historical Development | p. 326 |
Negative Ion Formation Processes | p. 327 |
Volume Formation of Negative Ions | p. 328 |
H- Formation by Electron Impact | p. 328 |
Negative Ion Formation by Multiple Charge-Transfer | p. 332 |
Surface Formation of Negative Ions | p. 338 |
Work-function of Surfaces | p. 338 |
Surface Sputtering | p. 342 |
Essential Principle | p. 343 |
Distributions of Sputtered Particles | p. 347 |
Particle Reflection from a Solid Surface | p. 348 |
Essential Principles | p. 348 |
Parameter Dependence of Reflection | p. 349 |
Distribution of Reflected Particles | p. 350 |
Secondary Ion Emission | p. 352 |
General Principles | p. 352 |
H- Ion Formation by Particle and Surface Interaction | p. 355 |
Other Negative Ions Formed by Sputtering | p. 356 |
Negative Surface Ionization | p. 357 |
Destruction of Negative Ions | p. 358 |
Destruction Processes of Negative Ions | p. 358 |
Cross-Sections of H- Destruction | p. 359 |
Volume H- Ion Source | p. 361 |
Duoplasmatron Negative Ion Sources | p. 361 |
Penning Negative Ion Sources | p. 363 |
Magnetically Filtered Multicusp Volume Sources | p. 364 |
Essential Principle | p. 364 |
Magnetic Filter | p. 364 |
Dependence on Various Parameters | p. 366 |
Cesium Seeded Multicusp H- Source | p. 368 |
Giant H- Ion Sources | p. 368 |
Other Volume Production Negative Ion Sources | p. 371 |
H- Ion Extraction and Electron Suppression | p. 372 |
Surface-Plasma H- Ion Sources | p. 374 |
Magnetron H- Ion Sources | p. 374 |
Penning Surface-Plasma H- Ion Sources | p. 377 |
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