| Introduction | p. 1 |
| Major Applications and Requirements | p. 1 |
| Performances and Research Subjects | p. 1 |
| Historical Development | p. 8 |
| Gas Discharge Fundamentals | p. 11 |
| Thermionic Emission | p. 11 |
| Secondary Electron Emission | p. 12 |
| Surface Ionization | p. 13 |
| Elastic and Inelastic Collisions | p. 16 |
| Collision and Probability of Collision | p. 16 |
| Elastic Collision and Its Cross Section | p. 18 |
| Inelastic Collision | p. 20 |
| Ionization Cross Section | p. 21 |
| Recombination of Charged Particles | p. 22 |
| Mobility | p. 23 |
| Diffusion Coefficient | p. 25 |
| Particle Distribution in a Retardation Region | p. 26 |
| Ambipolar Diffusion | p. 26 |
| Magnetic Field Influence on Particle Motion | p. 28 |
| Fundamentals of a Hot-Cathode Arc Source | p. 29 |
| Stable Theory of the Cathode Double Sheath | p. 29 |
| Bipolar Flow | p. 30 |
| CathodeDoubleSheath | p. 31 |
| Cathode Double Sheath Oscillations and Noise | p. 34 |
| Scattering of Primary Electrons | p. 35 |
| Beam-Plasma Interaction | p. 36 |
| Positive Column Plasma | p. 38 |
| Anode Region | p. 44 |
| Minimum Pressure | p. 45 |
| References | p. 46 |
| Extraction Systems for Ion Sources | p. 47 |
| Extraction Systems Requirements | p. 47 |
| Extraction System with a Solid Emitter | p. 48 |
| Space-Charge-Limited Flow for an Ideal Diode | p. 48 |
| Plane Diode | p. 48 |
| Cylindrical Diode | p. 51 |
| Spherical Diode | p. 51 |
| Some Universal Relationships | p. 52 |
| Space-Charge-Limited Flow with Multiple Ion Species | p. 54 |
| Pierce-Shape Extraction System | p. 56 |
| High-Perveance Electron Gun | p. 57 |
| Emittance and Brightness | p. 58 |
| Emittance | p. 58 |
| Brightness | p. 60 |
| Relation Between Brightness and Emittance | p. 61 |
| Effective Emittance | p. 62 |
| Emittance and Brightness of an Ion Source | p. 63 |
| Ion Extraction from a Plasma | p. 65 |
| Plasma-Sheath Equation and the Emitting Current from a Plasma | p. 65 |
| The "Extractable Flow" from an Extraction System | p. 70 |
| Adjustment of Ion Emissive Surface | p. 71 |
| Comparison between a Plasma Ion Source and an Electron Gun Extraction System | p. 72 |
| Geometry of Extraction Systems | p. 73 |
| Typical Types and Geometries | p. 73 |
| Probe Extraction Systems for Low Plasma Density | p. 76 |
| Principle and Analytical Model | p. 76 |
| Experimental Results | p. 79 |
| Aperture Extraction Systems for Medium Plasma Density | p. 79 |
| Analytical Model for a Two-Electrode System | p. 80 |
| Circular Three Electrode Extraction System | p. 83 |
| Slit Extraction System | p. 86 |
| Four Electrode Extraction System | p. 89 |
| Expansion Cup Extraction System for High Plasma Density | p. 90 |
| Some Properties of a Diffusing Plasma | p. 90 |
| Extraction System of a Duoplasmatron Source | p. 92 |
| Large-Area Multi-Aperture Extraction Systems | p. 95 |
| Multi-aperture Beam Focusing by Aperture Displacement | p. 96 |
| Power Loading of the Electrodes | p. 100 |
| Grid-controlled Extraction System | p. 101 |
| Research Methods of Extraction Systems | p. 103 |
| Experimental Research | p. 103 |
| Analytical Approaches to Beam Optics | p. 103 |
| Numerical Simulations | p. 104 |
| Physical Models | p. 104 |
| Physical Equations | p. 106 |
| Some Results | p. 108 |
| Some Other Problems | p. 110 |
| Transverse Magnetic Field Effects on Ion Extraction | p. 110 |
| Technological Problems of Extraction Systems | p. 111 |
| Suppression of Breakdown in the Lateral Extraction Ion Source | p. 111 |
| Some Technological Problems | p. 112 |
| References | p. 113 |
| Positive Ion Sources | p. 116 |
| Classification of Ion Sources | p. 116 |
| Hot Cathodes | p. 118 |
| Requirements and Types of Hot Cathodes | p. 118 |
| Cathode Material and Lifetime | p. 119 |
| Effects of Discharge Current | p. 122 |
| Magnetic Field Effects of the Filament Current | p. 122 |
| Plasma Cathodes | p. 123 |
| Arc Source in a Uniform Magnetic Field | p. 125 |
| Hot-Cathode Penning Source | p. 131 |
| Simple Principle | p. 131 |
| Typical Structures | p. 134 |
| Duoplasmatron Ion Source | p. 135 |
| General Principle | p. 135 |
| Formation of the Constriction Double Sheath | p. 137 |
| Primary Parameters | p. 138 |
| Heavy Ion Duoplasmatron Source | p. 141 |
| Hot-Cathode "Freeman" Source | p. 142 |
| Broad Beam Ion Sources | p. 144 |
| Cold-Cathode PIG Source | p. 148 |
| Principles of a Cold-Cathode Penning Discharge | p. 148 |
| Cold-Cathode PIG Sources | p. 149 |
| Radio-Frequency Ion Source | p. 153 |
| Principle of an RF Discharge | p. 153 |
| Magnetic Field Effects and Structures | p. 157 |
| Heavy Ion RF Sources | p. 159 |
| Metallic Ion RF Sources | p. 159 |
| RF Ion Source for Ion Thrusters | p. 161 |
| RF Tritium Ion Source | p. 162 |
| Beam Current Modulation from RF Sources | p. 162 |
| Technology of Heavy Ion Sources | p. 163 |
| Special Requirements for Heavy Ion Sources | p. 163 |
| Types of Heavy Ion Sources | p. 164 |
| Surface Ionization and Thermionic Emission Source | p. 165 |
| High Field Ion Source | p. 168 |
| Gas Field Ionization Source | p. 169 |
| Liquid Metal Ion Source | p. 170 |
| Feed Material | p. 174 |
| Methods of Vapor Transport | p. 176 |
| Design and Operation of Heavy Ion Sources | p. 179 |
| References | p. 182 |
| Giant Ion Sources | p. 187 |
| DuoPIGatron Ion Source | p. 188 |
| Essential Principle | p. 188 |
| Improvement of the Plasma Uniformity | p. 190 |
| Typical Results | p. 193 |
| Periplasmatron Ion Source | p. 196 |
| Multifilament Ion Source | p. 197 |
| Essential Principle | p. 197 |
| Multifilaments and Multislot Extraction Electrode | p. 199 |
| Ionization Efficiency | p. 200 |
| Typical Results | p. 201 |
| Magnetic Multipole Ion Source | p. 203 |
| General Description | p. 203 |
| Magnetic Multipole (Multicusp) Field | p. 204 |
| Confinement Principle of a Cusped Field | p. 204 |
| Magnetic Field Configuration | p. 206 |
| Influence of Other Parameters | p. 209 |
| Typical Results and Applications | p. 212 |
| Hall Accelerator | p. 213 |
| Cluster Ion Source | p. 216 |
| Intense Pulsed Ion Source | p. 218 |
| Reflex Triode | p. 219 |
| Magnetically Insulated Ion Diode | p. 220 |
| Anode Plasma and Structure | p. 222 |
| References | p. 225 |
| Multiply Charged Ion Sources | p. 229 |
| Introduction | p. 229 |
| Formation of Multiply Charged Ions | p. 231 |
| Physical Definitions for Multiple Ionization | p. 231 |
| Ionization Potential | p. 231 |
| Total and Partial Ionization Cross Section | p. 232 |
| Distribution of Charge States and Average Charge State | p. 233 |
| Formation of Multiply Charged Ions | p. 233 |
| Multiple Ionization by Single Collisions | p. 233 |
| Stepwise Single Ionization of Ions | p. 235 |
| Stepwise Multiple Ionization of Ions | p. 238 |
| Ionization of Metastable Atoms or Ions | p. 238 |
| Loss Processes of Multiply Charged Ions | p. 239 |
| Loss by Charge Transfer | p. 239 |
| Loss by Recombination | p. 240 |
| Loss by Diffusion | p. 241 |
| Balance Equations for Ion Charge States | p. 243 |
| Multiply Charged Ion Generation by Stripping of Fast Ions | p. 246 |
| Major Research of MCIS | p. 246 |
| Multiply Charged Electron Beam Ion Source | p. 249 |
| Electron Beam Ion Source | p. 249 |
| Typical Structure | p. 249 |
| Essential Principle and Results | p. 251 |
| Electron Beam Ion Trap | p. 255 |
| Time-of-Flight EBIS (TOFEBIS) | p. 256 |
| Conventional Multiply Charged Ion Sources | p. 256 |
| Penning Multicharged Ion Source | p. 256 |
| Introduction, Types, and Typical Structures | p. 256 |
| The Essential Principle of Generating Multiply Charged Ions in a PIG Source | p. 257 |
| Experimental Results | p. 258 |
| Duoplasmatron MCIS | p. 261 |
| Other Plasma Discharge MCIS | p. 263 |
| Radio-Frequency Ion Source | p. 263 |
| Electrostatic Oscillating Electron Ion Source | p. 263 |
| Trapped Ion Source | p. 264 |
| Microwave Ion Sources | p. 264 |
| Electron Cyclotron Resonance Multiply Charged Ion Source | p. 264 |
| Development and Typical Structure | p. 264 |
| Essential Principles and Results | p. 268 |
| High Intensity Microwave Ion Source | p. 277 |
| Cavity Type Microwave Ion Source | p. 277 |
| Antenna Type Microwave Ion Source | p. 281 |
| High-intensity Microwave Proton Source | p. 282 |
| Hot Electron Layer Ion Source (HELIOS) | p. 284 |
| Beam-Plasma Ion Source | p. 285 |
| High Density Plasma Sources | p. 286 |
| Laser Multiply Charged Ion Source | p. 286 |
| Metal Vapor Vacuum Arc Ion Sources | p. 292 |
| Vacuum Spark Ion Source | p. 297 |
| References | p. 297 |
| Mass and Energy Spectra of Ion Sources | p. 304 |
| Mass Spectra of a Hydrogen Ion Source | p. 304 |
| Physical Processes Effecting the Mass Spectra | p. 305 |
| Particle Balance Equations for Determining the Mass Spectra | p. 310 |
| Proton Content of an RF Ion Source | p. 313 |
| Mass Spectra of a Magnetic Multipole Ion Source | p. 314 |
| Mass Spectra of a Duoplasmatron Ion Source | p. 315 |
| Mass Spectra of a Hot-Cathode PIG Ion Source | p. 316 |
| Mass Spectra of a Cold-Cathode PIG Ion Source | p. 317 |
| Energy Spectra of Ion Sources | p. 318 |
| Physical Cause of the Energy Spread | p. 318 |
| Energy Spectra of an RF Ion Source | p. 319 |
| Energy Spectra of Other Ion Sources | p. 322 |
| References | p. 323 |
| Negative Ion Sources | p. 325 |
| Introduction | p. 325 |
| Electron Affinity | p. 325 |
| Historical Development | p. 326 |
| Negative Ion Formation Processes | p. 327 |
| Volume Formation of Negative Ions | p. 328 |
| H- Formation by Electron Impact | p. 328 |
| Negative Ion Formation by Multiple Charge-Transfer | p. 332 |
| Surface Formation of Negative Ions | p. 338 |
| Work-function of Surfaces | p. 338 |
| Surface Sputtering | p. 342 |
| Essential Principle | p. 343 |
| Distributions of Sputtered Particles | p. 347 |
| Particle Reflection from a Solid Surface | p. 348 |
| Essential Principles | p. 348 |
| Parameter Dependence of Reflection | p. 349 |
| Distribution of Reflected Particles | p. 350 |
| Secondary Ion Emission | p. 352 |
| General Principles | p. 352 |
| H- Ion Formation by Particle and Surface Interaction | p. 355 |
| Other Negative Ions Formed by Sputtering | p. 356 |
| Negative Surface Ionization | p. 357 |
| Destruction of Negative Ions | p. 358 |
| Destruction Processes of Negative Ions | p. 358 |
| Cross-Sections of H- Destruction | p. 359 |
| Volume H- Ion Source | p. 361 |
| Duoplasmatron Negative Ion Sources | p. 361 |
| Penning Negative Ion Sources | p. 363 |
| Magnetically Filtered Multicusp Volume Sources | p. 364 |
| Essential Principle | p. 364 |
| Magnetic Filter | p. 364 |
| Dependence on Various Parameters | p. 366 |
| Cesium Seeded Multicusp H- Source | p. 368 |
| Giant H- Ion Sources | p. 368 |
| Other Volume Production Negative Ion Sources | p. 371 |
| H- Ion Extraction and Electron Suppression | p. 372 |
| Surface-Plasma H- Ion Sources | p. 374 |
| Magnetron H- Ion Sources | p. 374 |
| Penning Surface-Plasma H- Ion Sources | p. 377 |
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