| List of Symbols | p. XIX |
| Acronyms | p. XXIV |
| Overview | p. 1 |
| Circuit Design with MOSFETs | p. 3 |
| MOSFET Modeling | p. 5 |
| Model Parameter Determination | p. 9 |
| Interconnect Modeling | p. 10 |
| Subjects Covered | p. 11 |
| References | p. 11 |
| Review of Basic Semiconductor and pn Junction Theory | p. 15 |
| Energy Band Model | p. 15 |
| Intrinsic Semiconductor | p. 17 |
| Fermi level | p. 19 |
| Extrinsic or Doped Semiconductor | p. 21 |
| Generation-Recombination | p. 25 |
| Quasi-Fermi Level | p. 27 |
| Electrical Conduction | p. 28 |
| Carrier Mobility | p. 28 |
| Resistivity and Sheet Resistance | p. 33 |
| Transport Equations | p. 36 |
| Continuity Equation | p. 37 |
| Poisson's Equation | p. 38 |
| pn Junction at Equilibrium | p. 39 |
| Built-in Potential | p. 42 |
| Depletion Width | p. 43 |
| Diode Current-Voltage Characteristics | p. 46 |
| Limitation of the Diode Current Model | p. 48 |
| Bulk Resistance | p. 51 |
| Junction Breakdown Voltage | p. 52 |
| Diode Dynamic Behavior | p. 53 |
| Junction Capacitance | p. 53 |
| Diffusion Capacitance | p. 56 |
| Small Signal Conductance | p. 57 |
| Real pn Junction | p. 58 |
| Diode Circuit Model | p. 61 |
| Temperature Dependent Diode Model Parameters | p. 64 |
| Temperature Dependence of I[subscript s] | p. 64 |
| Temperature Dependence of [Phi subscript bi] | p. 66 |
| Temperature Dependence of C[subscript jO] | p. 66 |
| References | p. 67 |
| MOS Transistor Structure and Operation | p. 69 |
| MOSFET Structure | p. 69 |
| MOSFET Characteristics | p. 73 |
| Punchthrough | p. 81 |
| MOSFET Capacitances | p. 82 |
| Small-Signal Behavior | p. 84 |
| Device Speed | p. 86 |
| MOSFET Scaling | p. 87 |
| Hot-Carrier Effects | p. 90 |
| VLSI Device Structures | p. 93 |
| Gate Material | p. 93 |
| Nonuniform Channel Doping | p. 94 |
| Source-Drain Structures | p. 95 |
| Device Isolation | p. 98 |
| CMOS Process | p. 99 |
| MOSFET Parasitic Elements | p. 102 |
| Source-Drain Resistance | p. 102 |
| Source/Drain Junction Capacitance | p. 108 |
| Gate Overlap Capacitances | p. 109 |
| MOSFET Length and Width Definitions | p. 113 |
| Effective or Electrical Channel Length | p. 113 |
| Effective or Electrical Channel Width | p. 114 |
| MOSFET Circuit Models | p. 115 |
| References | p. 118 |
| MOS Capacitor | p. 121 |
| MOS Capacitor with No Applied Voltage | p. 121 |
| Work Function | p. 123 |
| Oxide Charges | p. 127 |
| Flat Band Voltage | p. 131 |
| MOS Capacitor at Non-Zero Bias | p. 133 |
| Accumulation | p. 135 |
| Depletion | p. 135 |
| Inversion | p. 138 |
| Capacitance of MOS Structures | p. 147 |
| Low Frequency C-V Plot | p. 153 |
| High Frequency C-V Plot | p. 154 |
| Deep Depletion C-V Plot | p. 155 |
| Deviation from Ideal C-V Curves | p. 156 |
| Anomalous C-V Curve (Polysilicon Depletion Effect) | p. 159 |
| MOS Capacitor Applications | p. 161 |
| Nonuniformly Doped Substrate and Flat Band Voltage | p. 162 |
| Temperature Dependence of V[subscript fb] | p. 163 |
| References | p. 165 |
| Threshold Voltage | p. 167 |
| MOSFET with Uniformly Doped Substrate | p. 167 |
| Nonuniformly Doped MOSFET | p. 177 |
| Enhancement Type Device | p. 179 |
| Depletion Type Device | p. 190 |
| Threshold Voltage Variations with Device Length and Width | p. 194 |
| Short-Channel Effect | p. 195 |
| Narrow-Width Effect | p. 205 |
| Drain Induced Barrier Lowering (DIBL) Effect | p. 210 |
| Small-Geometry Effect | p. 219 |
| Temperature Dependence of the Threshold voltage | p. 221 |
| References | p. 225 |
| MOSFET DC Model | p. 230 |
| Drain Current Calculations | p. 230 |
| Pao-Sah Model | p. 235 |
| Charge-Sheet Model | p. 238 |
| Piece-Wise Drain Current Model for Enhancement Devices | p. 243 |
| First Order Model | p. 244 |
| Bulk-Charge Model | p. 251 |
| Square-Root Approximation | p. 253 |
| Drain Current Equation with Square-Root Approximation | p. 257 |
| Subthreshold Region Model | p. 259 |
| Limitations of the Model | p. 267 |
| Drain Current Model for Depletion Devices | p. 270 |
| Effective Mobility | p. 276 |
| Mobility Degradation Due to the Gate Voltage | p. 277 |
| Mobility Degradation Due to the Drain Voltage | p. 284 |
| Short-Geometry Models | p. 287 |
| Linear Region Model | p. 289 |
| Saturation Voltage | p. 291 |
| Saturation Region-Channel Length Modulation | p. 295 |
| Subthreshold Model | p. 305 |
| Continuous Model | p. 307 |
| Impact of Source-Drain Resistance on Drain Current | p. 310 |
| Temperature Dependence of the Drain Current | p. 313 |
| Temperature Dependence of Mobility | p. 314 |
| References | p. 318 |
| Dynamic Model | p. 325 |
| Intrinsic Charges and Capacitances | p. 325 |
| Meyer Model | p. 328 |
| Drawbacks of the Meyer Model | p. 334 |
| Charge-Based Capacitance Model | p. 337 |
| Long-Channel Charge Model | p. 340 |
| Capacitances | p. 347 |
| Short-Channel Charge Model | p. 352 |
| Capacitances | p. 356 |
| Limitations of the Quasi-Static Model | p. 359 |
| Small-Signal Model Parameters | p. 360 |
| References | p. 364 |
| Modeling Hot-Carrier Effects | p. 366 |
| Substrate Current Model | p. 367 |
| Gate Current Model | p. 374 |
| Correlation of Gate and Substrate Current | p. 382 |
| Mechanism of MOSFET Degradation | p. 383 |
| Measure of Degradation-Device Lifetime | p. 388 |
| Impact of Degradation on Circuit Performance | p. 394 |
| Temperature Dependence of Device Degradation | p. 396 |
| References | p. 398 |
| Data Acquisition and Model Parameter Measurements | p. 402 |
| Data Acquisition | p. 403 |
| Data for DC Models | p. 410 |
| Data for AC Models | p. 414 |
| MOS Capacitor C-V Measurement | p. 418 |
| Gate-Oxide Capacitance Measurement | p. 421 |
| Optical Method-Ellipsometry | p. 421 |
| Electrical Method | p. 422 |
| Measurement of Doping Profile in Silicon | p. 427 |
| Capacitance-Voltage Method | p. 428 |
| DC Method | p. 436 |
| Measurement of Threshold Voltage | p. 438 |
| Determination of Body Factor y | p. 443 |
| Flat Band Voltage | p. 445 |
| Drain Induced Barrier Lowering (DIBL) Parameter | p. 445 |
| Determination of Subthreshold Slope | p. 447 |
| Carrier Inversion Layer Mobility Measurement | p. 448 |
| Split-CV Method | p. 452 |
| Determination of Effective Channel Length and Width | p. 457 |
| Drain Current Methods of Determination [Delta]L | p. 458 |
| Capacitance Method of Determining [Delta]L | p. 468 |
| Methods of Determining [Delta]W | p. 470 |
| Determination of Drain Saturation Voltage | p. 472 |
| Measurement of MOSFET Intrinsic Capacitances | p. 477 |
| On-Chip Methods | p. 477 |
| Off-Chip Methods | p. 481 |
| Measurement of Gate Overlap Capacitance | p. 484 |
| Measurement of MOSFET Source/Drain Diode Junction Parameters | p. 489 |
| Diode Saturation or Reverse Current I[subscript s] | p. 489 |
| Junction Capacitance | p. 493 |
| References | p. 494 |
| Model Parameter Extraction Using Optimization Method | p. 501 |
| Model Parameter Extraction | p. 501 |
| Basics Definitions in Optimization | p. 504 |
| Optimization Methods | p. 510 |
| Constrained Optimization | p. 515 |
| Multiple Response Optimization | p. 518 |
| Some Remarks on Parameter Extraction Using Optimization Technique | p. 521 |
| Confidence Limits on Estimated Model Parameter | p. 522 |
| Examples of Redundant Parameters | p. 527 |
| Parameter Extraction Using Optimizer | p. 531 |
| Drain Current Model Parameter Extraction | p. 532 |
| MOSFET AC Model Parameter Extraction | p. 533 |
| References | p. 534 |
| SPICE Diode and MOSFET Models and Their Parameters | p. 536 |
| Diode Model | p. 536 |
| MOSFET Level 1 Model | p. 542 |
| DC Model | p. 542 |
| Capacitance Model | p. 543 |
| MOSFET Level 2 Model | p. 548 |
| DC Model | p. 548 |
| Capacitance Model | p. 552 |
| MOSFET Level 3 Model | p. 554 |
| DC Model | p. 554 |
| MOSFET Level 4 Model | p. 556 |
| DC Model | p. 556 |
| Capacitance Model | p. 559 |
| Comparison of the Four MOSFET Models | p. 559 |
| References | p. 561 |
| Statistical Modeling and Worst-Case Design Parameters | p. 563 |
| Methods of Generating Worst Case Parameters | p. 564 |
| Model Parameter Sensitivity | p. 566 |
| Principal Factor Method | p. 567 |
| Statistical Analysis with Parameter Correlation | p. 569 |
| Principal Component Analysis | p. 571 |
| Factor Analysis | p. 572 |
| Factor Rotation | p. 574 |
| Regression Models | p. 574 |
| Optimization Method | p. 575 |
| References | p. 578 |
| Important Properties of Silicon, Silicon Dioxide and Silicon Nitride at 300 K | p. 580 |
| Some Important Physical Constants at 300 K | p. 581 |
| Unit Conversion Factors | p. 581 |
| Magnitude Prefixes | p. 581 |
| Methods of Calculating [Phi subscript s] from the Implicit Eq. (6.23) or (6.30) | |
| Charge Based MOSFET Intrinsic Capacitances | p. 583 |
| Linear Regression | p. 587 |
| Basic Statistical and Probability Theory | p. 588 |
| List of Widely Used Statistical Package Programs | p. 599 |
| Subject Index | p. 600 |
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