Particles on Surfaces

Detection, Adhesion and Removal, Volume 9

By: Kash L. Mittal (Editor)

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Hardcover | 29 May 2006 | Edition Number 1

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Hardcover
364 Pages

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23.4 x 15.6 x 1.91

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This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004.
The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space.
This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book.
The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.

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Recent developments in imaging and analysis of micro- and nanosize particles and surface features	p. 3
Photodigital imaging as a means of monitoring particulate contamination on surfaces	p. 63
Determination of residual particles on surfaces : an updated method for particle extraction using ultrasonics	p. 75
Laser inactivation of surfaces and detection of bacteria	p. 83
Laser-assisted nanofabrication on surfaces using micro- and nanoparticles	p. 95
Clean-then-assemble versus assemble-then-clean : several comparisons	p. 107
Development of a non-contact post-CMP cleaning process for copper	p. 127
Using ozonated DI water for pre-gate cleaning	p. 145
Decontamination of surrogate Pu-238 legacy wastes	p. 153
Solar panel obscuration by dust and dust mitigation in the Martian atmosphere	p. 167
Adhesion and friction of single micrometer-sized particles	p. 199
The effect of laser-induced micro-roughness of textile fibers on adhesion and capture of micrometer-sized particles	p. 211
Advances in wafer cleaning and particle removal technology	p. 225
Particle removal challenges and solutions in semiconductor fabrication CMP processes	p. 243
Laser cleaning of model sub-micrometer particulate contaminants from Si surfaces	p. 255
Removal of particles using the combined effect of laser-induced shock wave and explosive vaporization of liquid	p. 267
Particle removal by attenuated total internal reflection of laser light	p. 277
Removal of sub-100-nm particles from structured substrates with CO[subscript 2] snow	p. 291
Particle removal by dense-phase fluids using ultrasonics	p. 303
Prediction of particle removal using surfactants	p. 317
Removal of micrometer-size particles from solid surfaces by an impinging air jet	p. 329
Table of Contents provided by Blackwell. All Rights Reserved.

Particles on Surfaces

Detection, Adhesion and Removal, Volume 9

At a Glance

Hardcover

Shipping

How to return your order

Defective items

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