Acknowledgements | p. vii |
Introduction | p. 1 |
Plasmas | p. 1 |
Plasma processing for microelectronics | p. 3 |
Plasma propulsion | p. 9 |
Radio-frequency plasmas: E, H and W-modes | p. 14 |
What lies ahead | p. 17 |
Plasma dynamics and equilibrium | p. 18 |
The microscopic perspective | p. 19 |
The macroscopic perspective | p. 37 |
Global particle and energy balance | p. 41 |
The electrodynamic perspective | p. 45 |
Review of Chapter 2 | p. 55 |
Bounded plasma | p. 59 |
The space charge sheath region | p. 61 |
The plasma/sheath transition | p. 72 |
The plasma region: transport models | p. 78 |
Review of Chapter 3 | p. 90 |
Radio-frequency sheaths | p. 96 |
Response times | p. 97 |
Ion dynamics | p. 102 |
Electron dynamics | p. 110 |
Analytical models of (high-frequency) RF sheaths | p. 116 |
Summary of important results | p. 130 |
Single-frequency capacitively coupled plasmas | p. 131 |
A constant ion density, current-driven symmetrical model | p. 133 |
A non-uniform ion density, current-driven model | p. 146 |
Global model | p. 154 |
Other regimes and configurations | p. 165 |
Summary of important results | p. 174 |
Multi-frequency capacitively coupled plasmas | p. 176 |
Dual-frequency CCP in the electrostatic approximation | p. 177 |
Electromagnetic regime at high frequency | p. 187 |
Summary of important results | p. 218 |
Inductively coupled plasmas | p. 219 |
Electromagnetic model | p. 222 |
Impedance of the plasma alone | p. 233 |
The transformer model | p. 236 |
Power transfer efficiency in pure inductive discharges | p. 241 |
Capacitive coupling | p. 243 |
Global model | p. 246 |
Summary of important results | p. 252 |
Further considerations | p. 253 |
Helicon plasmas | p. 260 |
Parallel propagation in an infinite plasma | p. 264 |
Helicon wave propagation in a cylinder | p. 268 |
Conditions for existence of the helicon modes | p. 276 |
Wave power absorption: heating | p. 277 |
E-H-W transitions | p. 283 |
Summary of important results | p. 286 |
Real plasmas | p. 287 |
High-density plasmas | p. 288 |
Magnetized plasmas | p. 293 |
Electronegative plasmas | p. 298 |
Expanding plasmas | p. 313 |
Electrical measurements | p. 318 |
Electrostatic probes | p. 319 |
Electrostatic probes for RF plasmas | p. 340 |
A retarding field analyser (RFA) | p. 348 |
Probing with resonances and waves | p. 354 |
Summary of important results | p. 365 |
Appendix: Solutions to exercises | p. 368 |
References | p. 375 |
Index | p. 383 |
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