Technology and Applications of Amorphous Silicon : Technology and Applications

Technology and Applications

By: Robert Street (Editor)

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Hardcover | 1 July 2009

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Hardcover
436 Pages

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23.39 x 15.6 x 2.39

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Amorphous silicon has enabled a new technology for large-area electronics, with major applications in liquid crystal displays, image sensing and solar power conversion. This book presents a broad description of the current technology and its future potential, so that the reader can understand how the particular properties of amorphous silicon lead to unique applications. Topics covered include the design of the amorphous silicon transistor and sensor devices, the range of matrix-addressed arrays and other systems that can be fabricated, and the performance of the various application areas.

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You Can Find This Book In

Non-Fiction Science Chemistry Crystallography Engineering & Technology Electronics & Communications Engineering Electronics Engineering Electronic Devices & Materials Semi-Conductors & Super-Conductors Energy Technology & Engineering Electrical Engineering Other Technologies & Applied Sciences

Applied Optics Mechanical Engineering & Materials Materials Science

Introduction	p. 1
Overview of the Book	p. 1
Development of Amorphous Silicon	p. 2
Basic Properties of Amorphous Silicon	p. 3
References	p. 5
Active-Matrix Liquid-Crystal Displays	p. 7
Introduction	p. 7
TFT LCD	p. 9
TFT LCD Configuration	p. 9
Pixel Design	p. 14
Design Analysis	p. 17
Scaling Theory of TFT LCD	p. 26
Fabrication of TFT Panels	p. 34
Thin-Film Transistors	p. 36
Hydrogenated Amorphous Silicon Thin-Film Transistors	p. 39
TFT Characteristics	p. 41
Threshold Voltage Shift	p. 49
Simulation of TFT Behavior	p. 53
Two-Terminal Devices	p. 60
Liquid Crystal	p. 61
Physical Constants of Liquid Crystal	p. 64
Twisted Nematic Cell	p. 69
In-Plane-Switching Cell	p. 81
Super-Twisted Nematic (STN) Cell	p. 87
References	p. 89
Laser Crystallization for Polycrystalline Silicon Device Applications	p. 94
Introduction	p. 94
Laser Processing of Polysilicon	p. 96
Polysilicon	p. 96
Laser Crystallization	p. 101
Grain Growth	p. 105
Surface Roughening	p. 110
Laser Doping	p. 111
Low-Temperature Poly-Si Devices	p. 11
Device Fabrication	p. 118
CMOS Device Performance	p. 121
Device Leakage Currents	p. 126
Device Stability	p. 130
Integration of a-Si and Poly-Si TFTs	p. 132
Development of Hybrid a-Si and Poly-Si Devices	p. 133
Hybrid Materials Processing	p. 135
Device Fabrication and Performance	p. 138
Conclusion	p. 142
References	p. 143
Large Area Image Sensor Arrays	p. 147
Introduction	p. 147
Devices	p. 148
P-i-n Photodiodes	p. 148
Thin Film Transistors	p. 157
Sensor Array Designs	p. 160
Matrix Addressed Readout	p. 161
TFT Addressed, p-i-n Photodiode Arrays	p. 161
High Fill Factor Array Designs	p. 171
TFT Addressed, X-Ray Photoconductor Arrays	p. 172
Diode Addressed Arrays	p. 175
CMOS Sensors	p. 178
Imaging Systems and Their Performance	p. 178
Electronics	p. 179
Electronic Noise	p. 185
X-Ray Detection	p. 191
The Performance of X-Ray Detectors	p. 194
Applications of Large Area Image Sensors	p. 204
Medical X-Ray Imaging	p. 204
Other Radiation Imaging Applications	p. 211
Document Scanning	p. 214
Future Developments	p. 216
References	p. 217
Novel Processing Technology for Macroelectronics	p. 222
Introduction	p. 222
Resolution and Registration: The Density of Functions Achievable by Printing	p. 225
Printed Toner Masks for Etching and Liftoff	p. 228
Toner Masks via Paper Transfer: TFTs on Glass Foil	p. 228
All Masks Printed Directly: TFTs on Steel Foil	p. 230
Printing Active Materials: Jetting Doped Polymers for Organic Light Emitting Devices	p. 232
Substrates and Encapsulation for Macroelectronic Circuits	p. 236
Plastic Substrate Foil: TFT on Polyimide	p. 244
3-D Integration on a Foil Substrate: OLED/TFT Pixel Elements on Steel	p. 246
Outlook	p. 249
References	p. 250
Multijunction Solar Cells and Modules	p. 252
Introduction	p. 252
Deposition Methods	p. 254
Glow-Discharge Deposition Technique	p. 254
Plasma Chemistry and the Growth Process	p. 254
Factors that Influence Film and Cell Quality	p. 256
Single-Junction Cells	p. 258
Cell Structure	p. 258
Cell Characteristics	p. 259
Numerical Modeling	p. 261
Light-Induced Degradation	p. 264
High Efficiency Cells	p. 268
Introduction	p. 268
Multijunction Cell	p. 269
Key Requirements for Obtaining High Efficiency	p. 270
Back Reflector	p. 270
Doped Layer	p. 275
Intrinsic Layers	p. 277
Optimization of the Component Cells and Current Matching	p. 281
Tunnel Junction	p. 282
Top Conducting Oxide	p. 285
Cell and Module Performance	p. 285
Manufacturing Technology	p. 287
Manufacturing Process	p. 287
Production Status and Product Advantage	p. 293
Alternative Technologies and Future Trends	p. 295
References	p. 299
Multilayer Color Detectors	p. 306
Introduction	p. 306
Applications of a-Si:H Color Sensors	p. 307
Optical Properties of Amorphous Silicon	p. 308
Optical Properties of Amorphous Silicon Alloys	p. 310
Optical Design of Layered a-Si:H Structures	p. 312
Two-Color Sensors	p. 315
Steady State and Transient Operation	p. 317
SPICE Model of the Two Color Detector	p. 319
Three Color Sensors	p. 320
Three Color Discrimination with Two Electrical Terminals	p. 320
Adjustable Threshold Three Color Detector (ATCD)	p. 323
Three Color Detectors in the Time Integration Regime	p. 327
Mechanism of Autopolarization of the Stacked Cells	p. 328
a-Si:H Based UV Sensors	p. 332
Structure and Operation of the UV Detector	p. 333
a-Si:H Based IR Sensors	p. 334
IR Detection by Differential Photo-Capacitance	p. 336
References	p. 338
Thin Film Position Sensitive Detectors: From 1D to 3D Applications	p. 342
Introduction and Historical Background	p. 342
Why Use Amorphous Silicon to Produce Position Sensitive Detectors?	p. 343
Principles of Operation of 1D and 2D PSD	p. 346
The Different Types of PSD Devices That Can Be Produced	p. 348
Different Types of a-Si:H TFPSD and the Production Processes Used	p. 349
Physical Model for the Lateral Photo-effect in a-Si:H p-i-n 1D and 2D TFPSD	p. 358
Introduction	p. 358
General Description of the 1D Theoretical Model	p. 359
Role of the Recombination Losses for the Fall-Off Parameter	p. 362
Static Behaviour of E_y and ¿_y	p. 364
Role of ¿_s and ¿_sd for the Device Detection Limits, Linearity, and Spatial Resolution	p. 365
Static Distribution of the Lateral Current	p. 365
Extension of the Theoretical 1D Model to the 2D Case	p. 367
Determination of the Transient Response Time of the TFPSD	p. 368
Static and Dynamic Detection Limits	p. 371
Static Detection Limits of 1D TFPSD	p. 371
Linearity and Spatial Resolution of 1D TFPSD	p. 372
Position Response to Multiple Light Beams	p. 374
Static Predicted and Experimental Performance of the 2D TFPSD Device	p. 376
Dynamic Performance of the 1D and 2D TFPSD	p. 376
Response Time of the TFPSD	p. 379
Detection of Light Signals with Different Wavelengths	p. 381
Characteristics of the a-Si:H p-i-n Structures Used to Produce the TFPSD	p. 383
J-V Curves	p. 383
Dependence of the Saturation Current of the Device on T	p. 385
Spectral Response and Detectivity	p. 386
Peripherals for 1D and 2D TFPSD Signal Processing	p. 387
Optical Methods	p. 387
Peripherals for Signal Processing	p. 389
Simulated and Experimental Data in 2D Optical Inspection Systems with TFPSD Detector	p. 392
Linear Array of Thin Film Position Sensitive Detector (LTFPSD)	p. 393
Principles of the Optical Methods Used	p. 394
Positional Resolution of the Array	p. 395
Hardware to Control Arrays of Multiple 1D Sensors	p. 396
Bandwidth Requirements for the Preamplifiers Used in the Hardware Control Unit of the LTFPSD	p. 398
Summary and Future Outlook	p. 399
References	p. 400
Symbols and Abbreviations	p. 404
Subject Index	p. 411
Table of Contents provided by Publisher. All Rights Reserved.

Technology and Applications of Amorphous Silicon : Technology and Applications