Interconnect Noise Optimization in Nanometer Technologies - Mohamed Elgamel

eTEXT

Interconnect Noise Optimization in Nanometer Technologies

By: Mohamed Elgamel, Magdy A. Bayoumi

eText | 20 March 2006

At a Glance

eText


$159.01

or 4 interest-free payments of $39.75 with

 or 

Instant online reading in your Booktopia eTextbook Library *

Read online on
Desktop
Tablet
Mobile

Not downloadable to your eReader or an app

Why choose an eTextbook?

Instant Access *

Purchase and read your book immediately

Read Aloud

Listen and follow along as Bookshelf reads to you

Study Tools

Built-in study tools like highlights and more

* eTextbooks are not downloadable to your eReader or an app and can be accessed via web browsers only. You must be connected to the internet and have no technical issues with your device or browser that could prevent the eTextbook from operating.
Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits. The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered.
Read online on
Desktop
Tablet
Mobile

More in Circuits & Components

Arduino Workshop - mark davies

eBOOK

Electromagnetics - steffano torres

eBOOK

Digital Electronics - Knowledge Flow

eBOOK

Electronic Circuits - Victor Martell

eBOOK